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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">cvmet</journal-id><journal-title-group><journal-title xml:lang="ru">Известия вузов. Цветная металлургия</journal-title><trans-title-group xml:lang="en"><trans-title>Izvestiya. Non-Ferrous Metallurgy</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">0021-3438</issn><issn pub-type="epub">2412-8783</issn><publisher><publisher-name>НИТУ МИСИС</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.17073/0021-3438-2023-1-66-74</article-id><article-id custom-type="elpub" pub-id-type="custom">cvmet-1452</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Металловедение и термическая обработка</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>Physical Metallurgy and Heat Treatment</subject></subj-group></article-categories><title-group><article-title>Сформированные наночастицами сплавы V–Cd: получение, фазовый состав и структура</article-title><trans-title-group xml:lang="en"><trans-title>V–Cd nanoparticle-formed alloys: fabrication, phase composition and structure</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Володин</surname><given-names>В. Н.</given-names></name><name name-style="western" xml:lang="en"><surname>Volodin</surname><given-names>V. N.</given-names></name></name-alternatives><bio xml:lang="ru"><p>д.ф.-м.н., д.т.н., профессор, главный научный сотрудник лаборатории ионноплазменных технологий</p><p>050032, Респ. Казахстан, г. Алматы, ул. Ибрагимова, 1 </p></bio><bio xml:lang="en"><p> Dr. Sci. (Phys.-Math.), Dr. Sci. (Eng.), Prof., Principal Scientist of the Laboratory “Ion-Plasma Technologies”</p><p>1 Ibragimov str., Almaty, 050032</p></bio><email xlink:type="simple">volodinv_n@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Тулеушев</surname><given-names>Ю. Ж.</given-names></name><name name-style="western" xml:lang="en"><surname>Tuleushev</surname><given-names>Yu. Zh.</given-names></name></name-alternatives><bio xml:lang="ru"><p>к.ф.-м.н., профессор, ведущий научный сотрудник лаборатории ионно-плазменных технологий</p><p>050032, Респ. Казахстан, г. Алматы, ул. Ибрагимова, 1 </p></bio><bio xml:lang="en"><p>Cand. Sci. (Phys.-Math.), Prof., Leading Scientist of the Laboratory “Ion-Plasma Technologies”</p><p>1 Ibragimov str., Almaty, 050032</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Калиева</surname><given-names>А. К.</given-names></name><name name-style="western" xml:lang="en"><surname>Kaliyeva</surname><given-names>A. K.</given-names></name></name-alternatives><bio xml:lang="ru"><p>младший научный сотрудник лаборатории ионно-плазменных технологий</p><p>050032, Респ. Казахстан, г. Алматы, ул. Ибрагимова, 1 </p></bio><bio xml:lang="en"><p> Junior Research Scientist of the Laboratory “Ion-Plasma Technologies”</p><p>1 Ibragimov str., Almaty, 050032</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Жаканбаев</surname><given-names>Е. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Zhakanbayev</surname><given-names>E. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>к.ф.-м.н., заведующий лабораторией ионно-плазменных технологий</p><p>050032, Респ. Казахстан, г. Алматы, ул. Ибрагимова, 1 </p></bio><bio xml:lang="en"><p> Cand. Sci. (Phys.-Math.), Head of the Laboratory “Ion-Plasma Technologies”</p><p>1 Ibragimov str., Almaty, 050032</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Мамырбаев</surname><given-names>А. К.</given-names></name><name name-style="western" xml:lang="en"><surname>Mamyrbayev</surname><given-names>A. K.</given-names></name></name-alternatives><bio xml:lang="ru"><p>инженер лаборатории ионно-плазменных технологий </p><p>050032, Респ. Казахстан, г. Алматы, ул. Ибрагимова, 1 </p></bio><bio xml:lang="en"><p>Engineer of the Laboratory “Ion-Plasma Technologies”</p><p>1 Ibragimov str., Almaty, 050032</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Институт ядерной физики Министерства энергетики Респ. Казахстан</institution><country>Казахстан</country></aff><aff xml:lang="en"><institution>Institute of Nuclear Physics, Ministry of Energy of Republic of Kazakhstan</institution><country>Kazakhstan</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2023</year></pub-date><pub-date pub-type="epub"><day>19</day><month>02</month><year>2023</year></pub-date><volume>29</volume><issue>1</issue><fpage>66</fpage><lpage>74</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Володин В.Н., Тулеушев Ю.Ж., Калиева А.К., Жаканбаев Е.А., Мамырбаев А.К., 2023</copyright-statement><copyright-year>2023</copyright-year><copyright-holder xml:lang="ru">Володин В.Н., Тулеушев Ю.Ж., Калиева А.К., Жаканбаев Е.А., Мамырбаев А.К.</copyright-holder><copyright-holder xml:lang="en">Volodin V.N., Tuleushev Y.Z., Kaliyeva A.K., Zhakanbayev E.A., Mamyrbayev A.K.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://cvmet.misis.ru/jour/article/view/1452">https://cvmet.misis.ru/jour/article/view/1452</self-uri><abstract><p>Приведены результаты исследований распыления и осаждения ультрадисперсных частиц ванадия и кадмия на необогреваемые и перемещаемые относительно потоков плазмы подложки. Были получены покрытия в интервале концентраций кадмия от 9,6 до 88,6 ат.%. Критическим размером частиц ванадия, способных к образованию сплавов с кадмием, определена величина 0,6 нм. Концентрационной границей существования твердых растворов кадмия в ванадии является содержание кадмия ~37 ат.%, при большей его доли пленочное покрытие представлено смесью фаз кадмия и твердого раствора кадмия в ванадии. Зависимость параметра решетки α-ванадия от содержания кадмия в нем соответствует следующему выражению: а [нм] = 8·10–4СCd + + 0,3707, где СCd – концентрация кадмия, ат.%. На поверхности образца в области твердых растворов (31,6 ат.% Cd) обнаружено наличие нитевидных кристаллов кадмия, причиной появления которых является решеточное давление матричного металла. Отжиг богатых по содержанию кадмия пленок (69,5 ат.%) в вакууме сопровождается растрескиванием покрытия и образованием пор. Последнее может быть использовано как метод получения пористого ванадия.</p></abstract><trans-abstract xml:lang="en"><p>The results of the study of targeted sputtering and deposition of ultrafine vanadium and cadmium particles on substrates that are not heated and shifted with respect to the substrate plasma currents are revealed. As a result of the conducted studies, coatings were obtained in the range with a concentration of cadmium from 9.6 to 88.6 at.%. The critical size of vanadium particles capable of forming alloys with cadmium is 0.6 nm. The concentration limit for the presence of solid solutions of cadmium in vanadium is the cadmium content of ~37 at.%, at a higher cadmium content the film coating is represented by a mixture of cadmium phases and a solid solution of cadmium in vanadium. The dependence of the lattice parameter of α-vanadium on the content of cadmium in it corresponds to the expression: а [nm] = 8·10–4СCd + 0.3707, where СCd is the concentration of cadmium, at.%. On the surface of the sample in the region of solid solutions (31.6 at.% Cd), the presence of threadlike crystals of cadmium was found, the reason for the appearance of which is the lattice pressure of the matrix metal. Annealing of films rich in cadmium (69.5 at.%) in vacuum is accompanied by cracking of the coating and the formation of pores. The latter can be used as a method for obtaining porous vanadium.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>ванадий</kwd><kwd>кадмий</kwd><kwd>наночастицы</kwd><kwd>сплав</kwd><kwd>твердый раствор</kwd><kwd>параметр решетки</kwd><kwd>покрытие</kwd><kwd>нитевидные кристаллы</kwd></kwd-group><kwd-group xml:lang="en"><kwd>vanadium</kwd><kwd>cadmium</kwd><kwd>nanoparticles</kwd><kwd>alloy</kwd><kwd>solid solution</kwd><kwd>lattice parameter</kwd><kwd>coating</kwd><kwd>threadlike crystals</kwd></kwd-group><funding-group><funding-statement xml:lang="ru">Работа выполнена при финансовой поддержке Министерства образования и науки Республики Казахстан (грант BR10965191).</funding-statement><funding-statement xml:lang="en">This work was supported financially by the Ministry of Education and Science of the Republic of Kazakhstan (grant BR10965191).</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Peppiatt S.J. 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